Goodbye Redness Centella Mask

Formulated with cica extract from the Centella Asiatica plant, this hypoallergenic mask deeply hydrates and soothes problem skin. Using Centella Asiatica for skin is soothing for all, but is especially beneficial for irritated, stressed and sensitive skin.

Ingredients We Love

• Cica extract (Centella Asiatica): Cica extract is an active compound extracted from the Centella Asiatica, that serves as an antioxidant, is a rich source of amino acids, and is known to have excellent hydrating effects to soothe irritated skin

Full List of Ingredients

Centella Asiatica Leaf Water (45%), Water, Glycerin, Pentylene Glycol, Butylene Glycol, Microcrystalline Cellulose, Centella Asiatica (Gotu Kola) Extract (1000ppm), Sodium Gluconate, Sodium Hyaluronate, Propanediol, Dipotassium Glycyrrhizate, Asiatic Acid, Madecassic Acid, Asiaticoside, Madecassoside, Portulaca Oleracea (Green Purslane) Extract, Xanthan Gum, Cellulose Gum, Caprylic/Capric Triglyceride, Hydrogenated Phosphatidylcholine, 1,2-Hexanediol, Sucrose Stearate, Cetearyl Alcohol

Ingredients are subject to change at the manufacturer's discretion. For the most complete and up-to-date list of ingredients, please refer to product packaging.